Titanium nitride (TiN) target is one of the most widely used metal-ceramic functional targets globally. It combines the electrical and thermal conductivity of metals with the high hardness and corrosion resistance of ceramics. Through processes like magnetron sputtering, balanced functional films can be deposited. These films provide essential wear protection for mechanical manufacturing, satisfy the high-precision functional requirements of semiconductor electronics, and seamlessly integrate aesthetic appeal with robust protection for decorative applications. It is widely used in high-end manufacturing fields such as machinery, electronics, decoration, aerospace, and new energy, making it a versatile core material across industries.

Outstanding Properties of Titanium Nitride (TiN)

• Excellent Density

  Relative density ≥98%, with grain sizes evenly distributed between 3-10 μm, reducing arc discharge during sputtering and improving film compositional uniformity.

• High Deposition Rate, No Fogging

  Optimized high deposition rates maximize efficiency, ensuring that films remain clear with both appearance and density guaranteed.

• Ultra-hard and Wear-resistant

  This target offers a consistent and robust hardness of more than 1800 HV (Vickers hardness). It provides wear resistance that is 4 to 8 times greater than conventional metal films while maintaining essential toughness to actively prevent film cracking and ensure coating integrity..

• Low Electrical Resistivity

  Room temperature resistivity ≤150 μΩ·cm, far exceeding traditional ceramic targets, making it suitable for semiconductor gates, heat dissipation coatings, and other conductive/thermal conductive applications.

• Adjustable Color

  Naturally golden in color, it can be adjusted to black, gray, and other colors through process optimization, meeting high-end decorative needs.

Wide Applications of Titanium Nitride (TiN)

1. Hard Coatings

   TiN coatings deliver a uniform, classic golden-yellow finish characterized by exceptional clarity, entirely free from fogging or particulate defects. Engineered for longevity, the surface is highly resistant to both fading and scratching, ensuring a pristine appearance even under rigorous, long-term use. It complies with RoHS environmental standards and increases production efficiency by over 30%.

2. Semiconductor Manufacturing

   Ensures stable signal transmission in electronic devices and extends lifespan. TiN coatings are fully compatible with advanced nodes below 7nm, supporting the most stringent semiconductor fabrication requirements and can achieve a semiconductor yield rates of ≥98%, while simultaneously delivering a 25% increase in mass production efficiency for the consumer electronics sector.

3. Optical Field

   TiN ensures superior image clarity and high light transmittance across all optical devices. By minimizing particulate defects, it significantly enhances lens yield rates, providing the high-volume capacity required to process thousands of precision optical components per day.