Main Target Materials:Cu, Ti, Al, RPD Materials, Yb, Ni, Ag, ITO, ZrO₂, H4

These materials can deposit high-purity, highly-uniform, dense, and stable films, achieving excellent optical, electrical, and mechanical properties. High-performance targets ensure material consistency and stability during film preparation, providing a reliable material foundation for flat-panel displays, optics, photovoltaics, semiconductors, functional films, and other fields.

1.RPD Target Applications

The targets are used in the RPD process for high-precision film deposition, enabling low resistance, high transmittance, and high uniformity in the films. They meet the stringent performance requirements of large-area displays, touchscreens, and optical devices. At the same time, high-stability targets support mass production and repeated processing, improving production efficiency.

2. Evaporation Material Applications

The targets can be used in physical vapor deposition (PVD) or vacuum evaporation processes to prepare optical films, conductive films, and functional layers. High-purity, high-density targets ensure film uniformity, adhesion, and chemical stability, and are widely applied in high-end fields such as display panels, solar cells, optical devices, functional glass, and decorative coatings.

Key Roles