Main Target Materials:Si, Nb, Cu, AI, Mo, Ti, Ni, Ag, Yb, SiB, GXO, MoOX,  Nb₂Ox, MoNb,AINd, CuNi

Evaporation Materials:Ag, AI, Yb

In the production of smart touchscreens and various flat-panel displays, sputtering targets are core materials for preparing transparent conductive films (TCFs), functional films, and interface layers. The quality of these materials directly affects display performance, touch responsiveness, and overall device stability. Using high-purity, high-uniformity sputtering targets ensures the deposition of low-resistance, high-transparency films that guarantee uniform screen brightness, true color reproduction, and enhanced touch sensitivity and response speed.

1.Display Panels

Sputtering targets are utilized for transparent conductive film (TCF) deposition, significantly enhancing screen brightness uniformity and contrast. This minimizes visual defects such as dark spots or color mismatches, ensuring stable, reliable, and high-quality display performance.

2.Touch Technology

Transparent conductive layers and sensing functional films deposited from sputtering targets enhance touch sensitivity and precision. These materials support advanced multi-touch and flexible screen applications while simultaneously extending overall device lifespan.

3.Flexible and High-End Flat Panel Displays

Films deposited from highly-dense, highly-stable target materials are suitable for use in advanced technologies, including flexible displays, OLED screens, and high-refresh-rate panels. These materials ensure superior film consistency, enhancing both device durability and overall display performance.