Main Target Materials:Si, SiB, SiO₂, Nb, Nb₂Ox, Ti, TiOX, Al, Cr, Zr, Hf, Ta, Ge

Evaporation Materials:MgF₂, Nb₂O₅, Al₂O₃, Ta₂O₅, HfO₂,Ti₃O₅, SiO₂/AI₂O₃, H4, YbF₃, SiO₂, TiO₂, ZrO₂

These target materials are essential for advanced optical thin-film deposition, delivering high uniformity, density, and stability across a variety of optical components. They play a critical role in specialized applications, including optical anti-reflection coatings, optical communication coatings, and optical glass coatings.

1.Optical Anti-reflection Coatings

Thin films deposited using high-purity sputtering targets effectively minimize surface reflection and maximize light transmittance. Widely applied in lenses, cameras, displays, and photovoltaic glass, these materials significantly improve image quality and optimize optical energy utilization.

2.Optical Communication Coatings

Sputtering targets deposit films with low loss and high stability, making them ideal for critical optical communication components like optical fibers, waveguides, and filters. This enhances signal transmission efficiency and boosts system reliability to meet the rigorous demands of high-speed, high-capacity communication networks.

3.Optical Glass Coatings

Sputtering targets are utilized for depositing advanced anti-reflection, scratch-resistant, and optical filter coatings onto optical glass. These coatings not only enhance the core optical performance and durability of glass but also provide additional functionalities such as UV protection, reduced reflection, and corrosion resistance, serving diverse applications in research, medical fields, and consumer electronics.