Tantalum Pentoxide (Ta₂O₅)

APG

Evaporation Materials

Tantalum Pentoxide (Ta₂O₅)

High Purity
Excellent Optical Properties
Good Electrical Properties
Strong Thermal Stability

Product Introduction

Tantalum pentoxide (Ta₂O₅) is an important functional inorganic oxide, characterized by a high dielectric constant, high refractive index, and excellent chemical stability. It is an insulator at room temperature, with a band gap of approximately 4.0–4.5 eV, and can form high-quality thin films through processes like vacuum evaporation or magnetron sputtering. Ta₂O₅ films exhibit high transparency, low absorption, and maintain stable physical and chemical properties over time, making it a key material in optical and electronic thin film manufacturing.

Outstanding Characteristics of Tantalum Pentoxide (Ta₂O₅)

  • High Dielectric Performance

    It has a dielectric constant (20 to 25) significantly higher than that of silica  which makes it suitable as a dielectric material for capacitors and high-k films.

  • Excellent Optical Properties

    It exhibits a refractive index of approximately 2.0–2.25 (at 500 nm), which is highly tunable via deposition process optimization. Coupled with superior optical transmittance, this characteristic makes it ideal for high-performance interference coatings and advanced optical systems..

  • Thermal and Chemical Stability

    It has exceptional thermal and chemical resilience, maintaining superior thin-film stability even when subjected to extreme temperatures and corrosive environments.

  • Low Absorption Loss

    Low absorption and scattering properties of the films leads to high efficiency and long lifespan for optical devices.

  • High Purity

    High-purity raw materials ensures a low-defect morphology during deposition. This optimization is critical for achieving the stringent performance uniformity and device stability required for next-generation electronic architectures.

Wide Applications of Tantalum Pentoxide (Ta₂O₅)

  1. Optical Device Manufacturing

    It is used in the preparation of anti-reflection coatings (AR coatings), optical filters, high refractive index layers, and multilayer interference films.

  2. It plays a significant role in advanced optical systems by providing a high refractive index and excellent transparency, making it a critical material for high-performance interference filters, anti-reflective coatings, and optical waveguides in lenses, projectors, and laser systems..

  3. Photovoltaic Industry

    It is used in anti-reflection coatings for solar cells to improve light absorption and energy conversion efficiency.

  4. It enhances the stability and weather resistance of thin-film solar modules.

  5. Semiconductor Manufacturing

    It is widely used in dielectric layers for DRAM, flash memory, and capacitors.

  6. As a high-k dielectric film in the semiconductor industry, it meets the demands for chip miniaturization and high performance.


Technical Characteristics

  • Refractive index:

    Refractive index:

    2-2.25(500nm)

  • Transparent band:

    Transparent band:

    350-9000nm

Application Fields

  • Optical Device Manufacturing

    Optical Device Manufacturing

  • Photovoltaic Industry

    Photovoltaic Industry

  • Semiconductor Manufacturing

    Semiconductor Manufacturing

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