Zirconium targets are sputtering targets processed from high-purity zirconium (Zr) metal. They feature low hydrogen absorption, a high melting point (1855℃), excellent corrosion resistance, and good thermal conductivity. They are widely used in semiconductors, optical coatings, and functional coatings. Due to zirconium’s excellent physical and chemical properties and strong affinity for oxygen, it can stably form high-quality films in vacuum sputtering environments.

Excellent Properties of Zirconium Targets

• Typically 99.5% – 99.9% purity, ensuring stable electrical and optical performance of the films.

• Melting point around 1855℃, maintaining stability under high-temperature processing conditions.

• Excellent Corrosion Resistance：Strong resistance to acids, alkalis, salts, and most chemical media, suitable for harsh environments.

• Low Neutron Absorption Cross-section：Important in the nuclear industry, especially for reactor components and their coatings.

• Strong Oxygen Affinity：Easily combines with oxygen during sputtering to produce high-quality zirconium oxide (ZrO₂) films, used in optical coatings, insulating layers, and other applications.

Applications of Zirconium Targets

1. Semiconductor Manufacturing

   Used to produce barrier layers, dielectric layers, or electrode materials, enhancing device performance and stability.

2. Optical Device Manufacturing

   Used to produce high-refractive-index films, such as optical filters and anti-reflection coatings.

3. Hard Coatings

   Often combined with nitrides (ZrN) to produce wear-resistant and corrosion-resistant coatings, used for tool coatings and decorative coatings.

4. Nuclear Industry

   Due to zirconium’s low neutron absorption, zirconium materials and their films have special applications in nuclear reactor components.