Products
Name：Niobium Oxide Target(Nb₂Ox)Chinese Name：Forming Process:Spraying,Hot PressingPurity:99.99%Product Specifications:Flat Targets,Rotary TargetsApplication Fields:Electronics Devices,Optics,Dynamic Random-Access Memory (DRAM)View Details
Name：Indium Gallium Zinc Oxide Target (IGZO) Chinese Name：Forming Process:SinteringPurity:99.99%Product Specifications:Flat Targets,Rotary TargetsApplication Fields:Display panels,Smart Mobile Devices,Flexible and Wearable Electronics,New Energy and Low-power Electronic DevicesView Details
Name：Aluminum-Doped Zinc Oxide Target (AZO) Chinese Name：Forming Process:Sintering,SprayingPurity:99.99%Product Specifications:Flat Targets,Rotary TargetsApplication Fields:Display Panels,Photovoltaic Industry,Optical Device Manufacturing,Sensors and Smart DevicesView Details
Name：Indium Tin Oxide Target (ITO)Chinese Name：Forming Process:SinteringPurity:99.99%Product Specifications:Planar Targets,Rotary targets,Custom-shaped TargetsApplication Fields:Touch Screen Technology,Liquid Crystal Displays (LCDs),Photovoltaic,Organic Light Emitting Diodes (OLEDs)View Details
