Products
Name：Nickel Target (Ni)Chinese Name：Nickel Target (Ni)Forming Process:Vacuum MeltingPurity:99.99%Product Specifications:Flat target,Rotating targetApplication Fields:Semiconductor Manufacturing,Magnetic Films,Decorative Coatings,Photovoltaic IndustryView Details
Name：Indium Target (In)Chinese Name：Forming Process:CastingPurity:99.99%-99.999%Product Specifications:Flat target,Rotating targetApplication Fields:Semiconductor Manufacturing,Photovoltaic Industry,Display Panels,Optical Device ManufacturingView Details
Name：Tantalum Target (Ta)Chinese Name：Forming Process:MeltingPurity:99.99%Product Specifications:Flat target,Rotating targetApplication Fields:Semiconductor Manufacturing,Optical Device Manufacturing,Hard Coatings and Decorative Coatings,Electronic ComponentsView Details
Name：Silicon Target (Si)Chinese Name：Forming Process:Spraying, Sintering, Crystal GrowthPurity:99.99%-99.999%Product Specifications:Flat target,Rotating targetApplication Fields:Optical Device Manufacturing,Semiconductor Manufacturing,Sensor ManufacturingView Details
