Products
Name：Hafnium Target (Hf)Chinese Name：Forming Process:Hot Pressing SinteringPurity:99.9%-99.99%Product Specifications:Flat target,Rotating targetApplication Fields:Semiconductor Manufacturing,Optical Device Manufacturing,Nuclear Industry,Aerospace and High-Temperature ProtectionView Details
Name：Molybdenum Target (Mo)Chinese Name：Forming Process:Hot Pressing SinteringPurity:99.95%-99.999%Product Specifications:Flat target,Rotating targetApplication Fields:Semiconductor Industry,Display Panels,Photovoltaic Industry,Low-emissivity GlassView Details
Name：Zirconium Target (Zr)Chinese Name：Forming Process:SinteringPurity:99.9%Product Specifications:Flat target,Rotating targetApplication Fields:Semiconductor Manufacturing,Optical Device Manufacturing,Hard Coatings,Nuclear IndustryView Details
Name：Nickel-Chromium Target (NiCr)Chinese Name：Forming Process:Pressing, SinteringPurity:99.9%-99.99%Product Specifications:Planar targets,rotating targets,irregularly shaped targetsApplication Fields:Electronics and Information Industry,Energy Sector,Aerospace and High-Temperature Applications,Precision Manufacturing and Other ApplicationsView Details
